Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS
By Jian Zhang, K. L. Tan, G. Hong, L. Yang, H. Gong. 2001
252 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Bioengineering, Biomedical Engineering
View Paper: https://www.semanticscholar.org/paper/f5154e980b3d908e405f148e0806829826b1abe7
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In Bioengineering
In Biomedical Engineering
Citations in the corpus
- Review of polymer MEMS micromachining (2015, methodology): “5 Physical methods such as water jetting [32], pyrolysis [33], and excimer laser patterning [176] can also be used to remove SU-8.”
- A new masking technology for deep glass etching and its microfluidic application (2004, methodology): “[19] J.”
- Fabrication of multi-layer SU-8 microstructures (2006, background): “In addition to exposure nonuniformities, components of the developing step also play an important role in the processing of SU-8 microstructures [25, 30, 32, 40].”
- Multidirectional UV Lithography for Complex 3-D MEMS Structures (2006, background): “Very high-aspect-ratio microstructures have been implemented from SU-8 photoresist (PR) using UV or near-UV light sources [4]–[7].”