Fabrication of multi-layer SU-8 microstructures

By A. Mata, Aaron J. Fleischman, Shuvo Roy. 2006

253 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/102d68b1d47706a08941b597f54d9d9f2b063529

Citations in the corpus

• Patterning surfaces with functional polymers. (2008, unknown): “We note that the fabrication of similar multi-tier structures by means of conventional photolithography would require the use of multiple photoresist layers and several exposure step”
• SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography (2007, unknown): “In order to reduce film stress and avoid SU-8 cracking during the multicoating processing, SU-8 resists of different viscosities (SU-8 2100 and 2010) were sequentially processed and simultaneously developed [109].”