Semiconductor Material and Device Characterization, 3rd Edition
By Dieter K. Schroder. 2005
666 citations recorded by the source corpus.
View Paper: https://www.semanticscholar.org/paper/ccb21dae8de638eac021502013b04d5083d99a15
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Citations in the corpus
- Monolithic Perovskite Tandem Solar Cells: A Review of the Present Status and Advanced Characterization Methods Toward 30% Efficiency (2020, background): “, as transport layers.[224] When the film thickness t is unknown, a sheet resistance Rs = ρ/t, in units Ω sq−1, is reported.”
- Gate Reliability Investigation in Normally-Off p-Type-GaN Cap/AlGaN/GaN HEMTs Under Forward Bias Stress (2016, methodology): “As widely used for gate oxide reliability investigations in Si MOSFETs [10]–[12] and recently adopted also for GaN based devices [9], [13], tB D distribution can be described by Weibull statistics.”
- Silicon surface passivation by atomic layer deposited Al2O3 (2008, unknown): “It can clearly be seen that the flatband voltage, which is related to the fixed charge density in the Al 2 O 3 , 55 is significantly different for the two films.”