S. Muhl
with Perez · 2015
A researcher in the Science corpus: 1 paper; trusts 1 researcher and is trusted by 0 researchers here, as inferred from the citation graph.
Whom S. Muhl trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Papers from S. Muhl's perspective
Ordered by how strongly the researchers S. Muhl trusts endorse each paper. Same corpus, a different order for every researcher.
- Handbook of physical vapor deposition (PVD) processing
- Plasma Physics and Engineering
- Introduction to the Physics of Highly Charged Ions
- Introduction to Plasma Physics and Controlled Fusion
- Fundamentals of Electric Propulsion: Ion and Hall Thrusters
- Transport Processes in Plasmas
- Sputtering yield measurements during low energy xenon plasma bombardment
- Plasma interaction with microbes
- Low-temperature sterilization using gas plasmas: a review of the experiments and an analysis of the inactivation mechanisms. (International journal of pharmaceutics)
- Low Temperature Plasma-Based Sterilization: Overview and State-of-the-Art
Their papers
- The use of hollow cathodes in deposition processes: A critical review (2015) — 137 citations