Global (interconnect) warming
By Kaustav Banerjee, A. Mehrotra. 2001
195 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/97f1e30db00f37e487dc96c77b85c44830a7b7e7
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In Electrical and Electronic Engineering
- Hong Li
- Kaustav Banerjee
- Kevin Skadron
- Karthik Sankaranarayanan
- Navin Srivastava
- Sivakumar Velusamy
- Wei Huang
- Mircea R. Stan
Citations in the corpus
- Power reduction techniques for microprocessor systems (2005, background): “The wires in a chip often use materials with poor thermal conductivity [Banerjee and Mehrotra 2001].”
- Scaling analysis of multilevel interconnect temperatures for high-performance ICs (2005, background): “ACCURATE estimates of multilevel interconnect temperatures are necessary for interconnect performance and reliability assessment in high-performance very large-scale integrated (VLSI) circuits [1]–[3].”
- On the Applicability of Single-Walled Carbon Nanotubes as VLSI Interconnects (2009, background): “This adversely affects interconnect reliability, since EM lifetime of Cu depends quadratically on J and exponentially on metal temperature (Tm ) [83].”
- HotSpot: a compact thermal modeling methodology for early-stage VLSI design (2006, background): “Most existing interconnect self-heating power and thermal models are either based on analysis of only a few wires [23] or need full-chip detailed layout information that is not available during early design stages [24].”