High RF performance TSV silicon carrier for high frequency application
By S. W. Ho, S. Yoon, Qiaoer Zhou, K. Pasad, V. Kripesh, John H. Lau. Electronic Components and Technology Conference, 2008
142 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/6e5e0176a890893764f4113f38a035bceabc7af9
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In Electrical and Electronic Engineering
Citations in the corpus
- TSV manufacturing yield and hidden costs for 3D IC integration (2010, background): “In the development of 3D IC integration, at least the following must be noted and understood: [1-41]”
- High-Frequency Modeling of TSVs for 3-D Chip Integration and Silicon Interposers Considering Skin-Effect, Dielectric Quasi-TEM and Slow-Wave Modes (2011, methodology): “In [40] and [41], the concept of coaxial TSVs was introduced and demonstrated up to 40 GHz.”
- Thermal management of 3D IC integration with TSV (through silicon via) (2009, background): “There are many critical issues of 3D IC integration [1-14], e.”