Marked Enhancement in the Efficiency of Deep-Ultraviolet AlGaN Light-Emitting Diodes by Using a Multiquantum-Barrier Electron Blocking Layer
By Hideki Hirayama, Yusuke Tsukada, Tetsutoshi Maeda, Norihiko Kamata. 2010
243 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Condensed Matter Physics, Electronic, Optical and Magnetic Materials
View Paper: https://www.semanticscholar.org/paper/5fcbfdde0ee532a6c32d055280d46ea5a0004a83
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In Biomedical Engineering
In Condensed Matter Physics
- M. Kneissl
- Hongxing Jiang
- Jingyu Lin
- Akira Hirano
- Matteo Meneghini
- Hideki Hirayama
- Ferdinand Scholz
- J. Rass
In Electronic, Optical and Magnetic Materials
Citations in the corpus
- Advances in group III-nitride-based deep UV light-emitting diode technology (2010, methodology): “layers on ML-AlN and could demonstrate UV-C LEDs on large-area AlN templates with high crystalline quality and output power levels in the mW range [12, 13].”
- The 2020 UV emitter roadmap (2020, background): “This may be addressed by multiple quantum barrier EBLs [131] which can provide a larger conduction band offset in comparison to AlN and allow for hole tunnelling due to quantum interference.”
- Hexagonal boron nitride for deep ultraviolet photonic devices (2014, methodology): “Although various interesting methods and schemes, such as enhancing p-type doping via minimizing the densities of hole compensating centers such as nitrogen vacancies with three (VN3+) or one (VN1+) positive charges [22–26], polarization and piezoelectric doping [27], p-AlGaN graded layers [28, 29],”