Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography

By Pieter Dumon, Wim Bogaerts, Vincent Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, Peter Bienstman, D. van Thourhout and 1 more. IEEE Photonics Technology Letters, 2004

474 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/f07b99c8bdb8926e3353c936dea052a20e189647

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In Atomic and Molecular Physics, and Optics

In Electrical and Electronic Engineering

In Surfaces, Coatings and Films

Citations in the corpus

Compact Wavelength-Selective Functions in Silicon-on-Insulator Photonic Wires (2006, methodology): “For incoupling and outcoupling, we use grating couplers that couple light directly from a broad ridge waveguide in and out of a standard single-mode fiber, which is positioned above the substrate at a 10◦ angle [4], [5].”
Microphotonics devices based on silicon microfabrication technology (2005, background): “grated, ultrasmall optical circuits or microphotonics devices, which are required for future optical network systems [1]–[5].”
Silicon Photonics: The Next Fabless Semiconductor Industry (2013, unknown): “The most common are high-confinement waveguides made out of the active device layer, either etched fully to the bottom oxide layer or partially etched with a timed process stop [26], [27].”
Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology (2005, methodology): “As an example, we briefly discuss ring resonators in photonic wires [21] and surface gratings for coupling to fibers [22], [23].”
Silicon-on-Insulator Spectral Filters Fabricated With CMOS Technology (2010, background): “By changing the coupling section and the bend radius, quality factors and drop efficiencies can be tuned in a relatively wide range [8], [11], [37].”
Silicon waveguide sidewall smoothing by wet chemical oxidation (2005, methodology): “Experimental loss was calculated from Fabry–Pérot measurements, waveguide top-surface roughness loss was determined from the AFM data, and substrate leakage loss was estimated from [13] and the Payne–Lacey loss versus waveguide fit.”
Review of Silicon Photonics Technology and Platform Development (2021, methodology): “220 nm de-facto standard was adopted by the research community [9], [10] achieving low losses [11] and tight bending radii”
Ultracompact optical buffers on a silicon chip (2007, methodology): “High-index-contrast silicon waveguide ring resonators having extremely small footprints and a high intrinsic quality factor Q have already been demonstrated 17,18,23–25, 29, 31, 33, 35 .”