A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

By A. Anders. 2014

267 citations recorded by the source corpus.

Subfields: Materials Chemistry, Mechanical Engineering, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/2829f35d0e2a835ff27961ae208b8129fcf8153f

Citations in the corpus

• Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands (2018, unknown): “HiPIMS technology allows for combining technologies, such as cathodic arc plasma deposition and ion plating, with this being its greatest advantage [88].”
• Towards smart electrolytic plasma technologies: An overview of methodological approaches to process modelling (2015, unknown): “It is not surprising to see smart elements, such as active plasma diagnostics and variable process parameters, in recent developments of plasma-based surface engineering technologies, e.g. PE-CVD [9, 10] 5 and Hi-PIMS [11, 12]; for EPPs however this still remains in a rudimentary state despite some ”