Electric-field effects on thickness dependent magnetic anisotropy of sputtered MgO/Co40Fe40B20/Ta structures
By M. Endo, S. Kanai, S. Ikeda, Fumihiro Matsukura, Hideo Ohno. 2010
430 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Mechanical Engineering
View Paper: https://www.semanticscholar.org/paper/e2bee61f94fae44350233b6553af919924c22d44
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In Atomic and Molecular Physics, and Optics
- Hideo Ohno
- Fumihiro Matsukura
- Juan G. Alzate
- Kang L. Wang
- P. Amiri
- M. Chshiev
- Bernard Dieny
- Shoji Ikeda
In Electronic, Optical and Magnetic Materials
- Hideo Ohno
- Juan G. Alzate
- Kang L. Wang
- P. Amiri
- Fumihiro Matsukura
- Shoji Ikeda
- Bernard Dieny
- M. Chshiev
In Mechanical Engineering
Citations in the corpus
- Low-power non-volatile spintronic memory: STT-RAM and beyond (2013, background): “Enhancement of the magnetoelectric coefficient has been demonstrated by stacking MgO next to a high-k dielectric [51, 52].”
- A perpendicular-anisotropy CoFeB-MgO magnetic tunnel junction. (2010, background): “The bulk contribution is consistent with the demagnetization ( − M S μ 0 ), indicating that K b is negligible, that is, that the perpendicular anisotropy in this system is entirely due to the CoFeB– MgO interfacial anisotrop”
- Perpendicular magnetic anisotropy at transition metal/oxide interfaces and applications (2017, background): “39), with a change of −23 μJ=m2 for 7.0 MV=cm, which corresponds to ∼33 μJ=m2 for 1 V=nm (Endo et al., 2010).”