Thermally activated trap charges responsible for hysteresis in multilayer MoS2 field-effect transistors
By Youngseo Park, H. Baac, J. Heo, G. Yoo. 2016
155 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/d83c5ca6b670a918be8e25a96f3301a1fa6a61df
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In Electrical and Electronic Engineering
In Materials Chemistry
Citations in the corpus
- A ferroelectric semiconductor field-effect transistor (2018, background): “Discussions on the accuracy of field-effect mobility The field effect mobility (μFE) is a defined as (3), μFE = Lgm WCoxVDS (1) gm = dID dVGS (2) The transconductance (gm) is usually extracted from the transfer (ID-VGS) characteristics of the devices.”
- Reversible hysteresis inversion in MoS2 field effect transistors (2017, methodology): “7b).(22) Trap density extracted at room temperature was normalized with MoS2 flake thickness to give the total intrinsic trap density considering that hysteresis at low temperature stems from intrinsic MoS2 traps.”