Fabrication of add-drop filters based on frequency-matched microring resonators

By Tymon Barwicz, Miloš A. Popović, Michael R. Watts, Peter T. Rakich, E. Ippen, Henry I. Smith. Journal of Lightwave Technology, 2006

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Polarization-transparent microphotonic devices in the strong confinement limit (2007, background): “This relative dimensional control was achieved through precise adjustments of the electron beam (e-beam) exposure dose of the various microrings and a tailored e-beam writing strateg”
Fabrication of Photonic Wire and Crystal Circuits in Silicon-on-Insulator Using 193-nm Optical Lithography (2009, background): “Even though e-beam steering can allow accurate dimensional control [7], it is tedious, slow and, due to the small writing area it is unsuitable for mass production.”
Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology (2010, methodology): “[7] demonstrated matching of two rings in a second-order ring filter with high accuracy (26 pm) using e-beam lithography.”
Robust optical delay lines with topological protection (2011, background): “Such imperfections are a common problem in photonics and prevent coupling large numbers of resonator”