Fabrication of Photonic Wire and Crystal Circuits in Silicon-on-Insulator Using 193-nm Optical Lithography
By Shankar Kumar Selvaraja, P. Jaenen, Wim Bogaerts, D. van Thourhout, Pieter Dumon, R. Baets. Journal of Lightwave Technology, 2009
248 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/8fc23a785ca3c7438a0863d0480094d87ec37a60
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In Atomic and Molecular Physics, and Optics
- Wim Bogaerts
- Shankar Kumar Selvaraja
- D. van Thourhout
- R. Baets
- Pieter Dumon
- J. Brouckaert
- K. Vos
- Joris Roels
In Electrical and Electronic Engineering
- Wim Bogaerts
- Shankar Kumar Selvaraja
- D. van Thourhout
- R. Baets
- Pieter Dumon
- J. Brouckaert
- K. Vos
- Joris Roels
In Surfaces, Coatings and Films
Citations in the corpus
- Silicon-on-Insulator Spectral Filters Fabricated With CMOS Technology (2010, methodology): “After baking and developing, the pattern is transferred into the silicon using an inductive coupled plasma reactive ion etch (ICP-RIE) etch. Finally, the resist is stripped [ 3 ].”
- Compact Single-Mode Silicon Hybrid Rib/Strip Waveguide With Adiabatic Bends (2011, methodology): “High alignment accuracy (G 12 nm) of the 193 nm optical scanner allows good alignment between the two layers, which is crucial to avoiding the mode mismatch between the shallow rib waveguide and photonic wire bends [6], [ 14 ].”
- Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology (2010, unknown): “A detailed explanation about the fabrication process used in our experiment can be found elsewhere [11].”
- Optomechanical device actuation through the optical gradient force (2010, methodology): “: light was injected into a silicon strip waveguid”