Reduced electric field in junctionless transistors
By Jean-Pierre Colinge, Chi-Woo Lee, Isabelle Ferain, N. Akhavan, Ran Yan, P. Razavi, R. Yu, A. Nazarov, R. Doria. 2010
318 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/aa365ebee81801dc952c3c712cc80255267bbcb9
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Biomedical Engineering
- Yang-Kyu Choi
- Jean-Pierre Colinge
- Suresh Gundapaneni
- Anil Kottantharayil
- S. Ganguly
- Te-Kuang Chiang
- Antonio Gnudi
- Elena Gnani
In Electrical and Electronic Engineering
- Juan Pablo Duarte
- Sung-Jin Choi
- Yang-Kyu Choi
- Isabelle Ferain
- Ran Yan
- Chi-Woo Lee
- Jean-Pierre Colinge
- Te-Kuang Chiang
Citations in the corpus
- Junctionless Multiple-Gate Transistors for Analog Applications (2011, background): “A reduction of E(x) is observed when VGT is increased in JL devices, whereas an increase of the electric field is observed when the gate voltage is increased in IM transistors, as reported in [32].”
- Junctionless Transistors: Physics and Properties (2011, background): “This strongly reduces the degradation of mobility when gate voltage is increased in the on state [5].”
- RF Performance and Small-Signal Parameter Extraction of Junctionless Silicon Nanowire MOSFETs (2011, background): “solutions for these challenges, junctionless (JL) MuGFETs have been proposed as a novel structure to make a breakthrough for the junction-induced design issues [22]–[25].”
- Sensitivity of Threshold Voltage to Nanowire Width Variation in Junctionless Transistors (2011, background): “in junctionless transistors would become small [9], the simulated results suggest that the comprehensive analysis of the VT fluctuation caused by both the RDF and Wsi variation is required.”