High-performance, tensile-strained Ge p-i-n photodetectors on a Si platform
By Jifeng Liu, Jürgen Michel, W. Giziewicz, D. Pan, K. Wada, D. D. Cannon, S. Jongthammanurak, D. T. Danielson, Lionel C. Kimerling, Jian Chen and 3 more. 2005
220 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/935336b2144c9f776d620ed56cf696ccf786f61d
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In Electrical and Electronic Engineering
In Materials Chemistry
- M. Freitag
- Phaedon Avouris
- Steven J. Koester
- Joerg Appenzeller
- Shinji Yamashita
- Frank Schwierz
- Yu-ming Lin
- Joachim Knoch
Citations in the corpus
- Toward a Germanium Laser for Integrated Silicon Photonics (2010, background): “strained epitaxial germanium films have been grown as an active medium in photodetectors with improved performance in the telecommunication wavelength bands [18], [19].”
- Germanium-on-SOI Infrared Detectors for Integrated Photonic Applications (2006, background): “strain effects that can improve absorption at longer wavelengths [54], alternative geometries may still have to be utilized for optimal operation at 1550 nm.”
- Graphene Photonics, Plasmonics, and Optoelectronics (2014, background): “tors [101] and with a much smaller footprint than ion-implanted Si detectors [102].”