Si/SiGe heterostructure parameters for device simulations
By L. Yang, J. Watling, R. Wilkins, M. Boriçi, J. Barker, Asen Asenov, Scott Roy. 2004
166 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/838e9a203a54689a6fd7f8ce1ed433beda8a1f4e
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In Atomic and Molecular Physics, and Optics
In Electrical and Electronic Engineering
Citations in the corpus
- Steep Subthreshold Slope n- and p-Type Tunnel-FET Devices for Low-Power and Energy-Efficient Digital Circuits (2009, background): “bandgap decreases as x is increased [32], and considering the exponential dependence of the B2B tunneling probability on Eg in (1), higher tunneling current can be achieved by using the SiGe layer.”