Reliability Characteristics of Ferroelectric $ \hbox{Si:HfO}_{2}$ Thin Films for Memory Applications

By Stefan Mueller, J. Müller, Uwe Schroeder, Thomas Mikolajick. IEEE transactions on device and materials reliability, 2013

169 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/0094d1ae0fe1db1ee867b876578d61a245b6e5d9