Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

By K. Ellmer, Thomas Welzel. 2012

139 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/fb9aa711729f90b0616c075b4ce7d0dd704a34f3

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. A. Anders
2. K. Ellmer
3. A. Bikowski
4. Claes-Goran Granqvist

In Materials Chemistry

1. K. Ellmer
2. A. Anders
3. A. Bikowski
4. Claes-Goran Granqvist

In Mechanics of Materials

1. K. Ellmer
2. A. Anders
3. J. Gudmundsson

Citations in the corpus

• Intrinsic and extrinsic doping of ZnO and ZnO alloys (2016, background): “This leads to a higher number of secondary electrons at the target surface during the sputtering process, increasing the probability of the formation of negative ions close to the target surface, which will then be accelerated in the cathode sheath towards the film surface [291, 292].”
• A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (2014, background): “As a consequence, films are less conducting and more absorbing, which is of special concern for transparent conducing oxides [238-240].”