High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering

By Jianliang Lin, W. Sproul, J. J. Moore, S. Lee, S. Myers. 2011

146 citations recorded by the source corpus.

Subfields: Computational Mechanics, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/e2b8a620f24c244fc52c76318aa87fb2757f4b3f

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Computational Mechanics

1. A. Anders

In Materials Chemistry

1. A. Anders

In Mechanics of Materials

1. A. Anders
2. J. Gudmundsson

Citations in the corpus

• A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (2014, methodology): “Such concept was realized in the Modulated Pulsed Power (MPP) sputtering system by the company ZPulser [177], characterized e.g. by Meng and coworkers [178].”