Deposition rates of high power impulse magnetron sputtering: Physics and economics
By A. Anders. 2010
212 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Mechanics of Materials
View Paper: https://www.semanticscholar.org/paper/dfac981c2955f24e2d2898d77ef974984506ff00
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Electrical and Electronic Engineering
In Mechanics of Materials
Citations in the corpus
- A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (2014, background): “In most but not all cases notably lower (several 10% lower) compared to the deposition rates of dc sputtering at the same power [309], primarily due to return effect of ionized sputtered material, but also affected by a host of other changes [310] including the energy dependence of the sputter yield”