Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography

By W. H. Teh, U. Dürig, U. Drechsler, Charles G. Smith, H. Güntherodt. 2005

159 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Computational Mechanics

View Paper: https://www.semanticscholar.org/paper/dbb9157af400852c9f4deab53fc98a92debc1a84

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In Biomedical Engineering

1. Brian J. Kim
2. Ellis Meng

Citations in the corpus

• SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography (2007, unknown): “reactions after application of heat [52].”
• Review of polymer MEMS micromachining (2015, background): “(via two-photon-absorption patterning) [166] laser, e-beam [167], and proton beam [168–170] to expose small complex”