SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
By A. Campo, C. Greiner. 2007
829 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/0cbb9404b32f40998a74c60cc141e2b992ad57c7
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In Biomedical Engineering
In Electrical and Electronic Engineering
Citations in the corpus
- Natural and biomimetic artificial surfaces for superhydrophobicity, self-cleaning, low adhesion, and drag reduction (2011, neutral): “del Campo and Greiner [64] reported that SU-8 hierarchical patterns comprising of features with lateral dimensions ranging from 5 mm to 2 mm and heights from 10 to 500 lm were obtained by photolithography, which comprises of a step of layer-by-layer exposure in soft contact printed shadow masks whic”
- Micro-, nano- and hierarchical structures for superhydrophobicity, self-cleaning and low adhesion (2009, methodology): “A number of artificial roughness-induced hydrophobic surfaces have been fabricated with hierarchical structures using electrodeposition, nanolithography, colloidal systems and photolithography (Shirtcliffe et al. 2004; Ming et al. 2005; Chong et al. 2006; del Campo & Greiner 2007).”