Handbook of plasma immersion ion implantation and deposition

By A. Anders. 2004

530 citations recorded by the source corpus.

View Paper: https://www.semanticscholar.org/paper/d6a49c1840ddc8071ad1771d40ce11504da3b384

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

1. J. Pelletier
2. A. Anders
3. J. Gudmundsson
4. D. Lundin

Citations in the corpus

• Fundamentals of pulsed plasmas for materials processing (2004, unknown): “These techniques have been reviewed recently [22-25].”
• Plasma and Ion Sources in Large Area Coatings: A Review (2005, methodology): “Plasma Immersion Techniques Plasma Immersion Ion Implantation (PIII) is a large-area processing technique based on the formation of a high-voltage sheath between plasma and biased substrate [15].”
• Plasma-based ion implantation and deposition: a review of physics, technology, and applications (2005, background): “FUTURE PROSPECTS AND TRENDS Until the mid 1990s, the size and number of substrates was increased and the pulsed high voltage reached the 100 kV level [37].”