Polymer Imprint Lithography with Molecular-Scale Resolution

By F. Hua, Yugang Sun, A. Gaur, M. Meitl, L. Bilhaut, L. Rotkina, Jingfeng Wang, P. Geil, M. Shim, John A. Rogers and 1 more. 2004

404 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering

View Paper: https://www.semanticscholar.org/paper/cd8fdc06868d0cdcdc83d0f2f1394a331106f2fa

How researchers see this paper

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In Atomic and Molecular Physics, and Optics

1. Z. Nie
2. Eugenia Kumacheva

In Biomedical Engineering

1. Stephen Y. Chou
2. Z. Nie
3. Eugenia Kumacheva
4. G. Horowitz

Citations in the corpus

• Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography (2005, background): “Recent studies have improved NIL resolution below 5 nm [3] and to the molecular scale [4].”
• 6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography (2005, background): “Although not the narrowest lines so far imprinted [12], these lines were densely packed and the GaAs grating mould ensured that the linewidth and half-pitch were constricted to 6 nm.”
• Patterning surfaces with functional polymers. (2008, methodology): “Both thermal NIL and UV-NIL methods have demonstrated as low as 5-nm horizontal patterning resolutio”