Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

By S. Kim, G. Choi, Sang Young Lee, Minha Seo, Sang Woon Lee, J. Han, H. Ahn, Seungwu Han, C. S. Hwang. 2008

294 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/b1ed9ee7654d2dbb2b3f7256046b2e2ca1e6346c