Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes
By Tadatsugu Minami. 2008
704 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/a3135fad695097f093e4265139856dc1ecced0ec
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In Electrical and Electronic Engineering
- Uwe Schroeder
- Thomas Mikolajick
- I. Fina
- Vincent Garcia
- J. MacManus‐Driscoll
- M. Lira-Cantú
- B. Dkhil
- G. Niklasson
In Materials Chemistry
- Uwe Schroeder
- Thomas Mikolajick
- Vincent Garcia
- Manuel Bibes
- I. Fina
- J. MacManus‐Driscoll
- M. Lira-Cantú
- B. Dkhil
Citations in the corpus
- Towards Oxide Electronics: a Roadmap (2019, background): “It is reported that RF and DC-magnetron sputtering deposition techniques with and without H2 gas are the best pro-cesses to develop transparent conducting impurity-doped ZnO thin films [807,808].”