Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

By G. Dingemans, W. Beyer, Van de Sanden, W. Kessels. 2010

183 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/92d8f2d4ffa659b591840e78bc6e797a3316de1d