The mean free path of electrons in metals

By E. Sondheimer. 2001

2,474 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/91de4197299d939c438be6a6840b60db3b5b9882

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Hong Li
2. Kaustav Banerjee
3. Chuan Xu
4. Navin Srivastava
5. J. Sinova
6. A. Manchon
7. T. Jungwirth
8. A. Thiaville

In Electronic, Optical and Magnetic Materials

1. Pietro Gambardella
2. Kaustav Banerjee
3. J. Sinova
4. A. Thiaville
5. Hong Li
6. Chuan Xu
7. G. Hilton
8. Navin Srivastava

In Mechanics of Materials

1. Kaustav Banerjee
2. Hong Li
3. Chuan Xu
4. G. Hilton
5. Navin Srivastava
6. K. Irwin

Citations in the corpus

• Scaling analysis of multilevel interconnect temperatures for high-performance ICs (2005, background): “I. INTRODUCTION ACCURATE estimates of multilevel interconnect temper-atures are necessary for interconnect performance and reliability assessment in high-performance very large-scale integrated (VLSI) circuits [1]–[3].”
• Carbon Nanomaterials for Next-Generation Interconnects and Passives: Physics, Status, and Prospects (2009, methodology): “Typically, the CNT diameter (< 40 nm) is much smaller than its classical skin depth (defined as δCSE = √ 2ρeff/μω [124] where ρeff is the effective resistivity) when frequency is below 100 GHz.”