Stability of Al2O3 and Al2O3/a-SiNx:H stacks for surface passivation of crystalline silicon

By G. Dingemans, P. Engelhart, R. Seguin, F. Einsele, B. Hoex, Van de Sanden, W. Kessels. 2009

156 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/83bc3d683682c2fdb829549eccdb745ddf60affb