Recent progress in soft lithography

By John A. Rogers, Ralph G. Nuzzo. 2005

455 citations recorded by the source corpus.

The future of nanoscience and nanotechnology depends critically on techniques for micro- and nanofabrication. An emerging set of methods, known collectively as soft lithography, uses elastomeric stamps, molds, and conformable photomasks for patterning two- and three-dimensional structures with minimum feature sizes deep into the nanometer regime. The powerful patterning capabilities of these techniques together with their experimental simplicity make them useful for a wide range of applications. This article reviews recent progress in the field of soft lithography, with a focus on trends in research and steps toward commercialization.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging

View Paper: https://www.semanticscholar.org/paper/6ebc761e7bec230f618f0ac1c72db3790784e038

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In Biomedical Engineering

  1. Leandro Lorenzelli
  2. Ravinder S. Dahiya
  3. Javier Andreu-Perez
  4. Saleem Khan
  5. Daniel Mark
  6. Guang-Zhong Yang
  7. Günter Roth
  8. Daniel Richard Leff

In Electrical and Electronic Engineering

  1. Ravinder S. Dahiya
  2. Saleem Khan
  3. Daniel Mark
  4. Javier Andreu-Perez
  5. Guang-Zhong Yang
  6. Günter Roth
  7. Daniel Richard Leff
  8. Jurriaan Huskens

In Radiology, Nuclear Medicine and Imaging

  1. Javier Andreu-Perez
  2. Guang-Zhong Yang
  3. Daniel Richard Leff
  4. Jurriaan Huskens
  5. C. Acikgoz
  6. G. Vancso
  7. Henry M. D. Ip
  8. M. Hempenius

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