Large area dense nanoscale patterning of arbitrary surfaces

By Miri Park, P. Chaikin, R. Register, D. Adamson. 2001

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Polymer self assembly in semiconductor microelectronics (2006, methodology): “Fabrication schemes using organic templates often incorporate oxide or nitride hardmask processes and two-step etch procedures in order to achieve sufficient contrast [48, 174].”
Development of Patterns for Digital Image Correlation Measurements at Reduced Length Scales (2007, methodology): “One method applicable to nanoscale strain measurements is digital image correlation, which requires the presence of a randomly-patterned material surface [1–4].”