Development of Patterns for Digital Image Correlation Measurements at Reduced Length Scales
By Wally A. Scrivens, Y. Luo, Michael A. Sutton, S. Collette, M.L. Myrick, Paul G. Miney, P. Colavita, Anthony P. Reynolds, Xiaodong Li. 2007
168 citations recorded by the source corpus.
Subfields: Computational Mechanics, Computer Vision and Pattern Recognition, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/505c4976407a92f31b1fce8fac87260ac9019ecd
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Computational Mechanics
In Computer Vision and Pattern Recognition
- F. Gioacchino
- Michael A. Sutton
- J. Quinta da Fonseca
- Jean-José Orteu
- H. Schreier
- Xiaodong Li
- N. Li
- D. Garcia
In Electrical and Electronic Engineering
Citations in the corpus
- Self-Assembled Nanoparticle Surface Patterning for Improved Digital Image Correlation in a Scanning Electron Microscope (2013, unknown): “Existing techniques include photolithography [3, 5], thin film ablation [6], electron-beam (e-beam) lithography [7-9] and nanoparticles [7, 10, 11].”
- Plastic Strain Mapping with Sub-micron Resolution Using Digital Image Correlation (2013, methodology): “Developed by Luo [28], the remodelling method was first proposed by Scrivens [29] as a viable pattern application technique for digital image correlation studies and subsequently used by Sutton for the assessment of SEM image distortions and to measure averaged strains in aluminium using an imaging ”
- Scanning Electron Microscopy for Quantitative Small and Large Deformation Measurements Part II: Experimental Validation for Magnifications from 200 to 10,000 (2007, methodology): “To have much smaller size of gold pattern on the aluminum specimen, the evaporation coating technique [26] is used instead of the photo resistance development technique for the ×200 pattern.”