Polymer self assembly in semiconductor microelectronics
By Charles T. Black, Ricardo Ruiz, Gregory Breyta, Joy Y. Cheng, Matthew E. Colburn, Kathryn W. Guarini, Ho-Cheol Kim, Y. Zhang. International Electron Devices Meeting, 2006
395 citations recorded by the source corpus.
Integration of polymer self assembly with semiconductor processing enables sub-lithographic patterning of integrated circuit (IC) device elements and offers a non-traditional pathway to performance improvements (Black, 2005). We discuss target applications including surface-roughening for on-chip decoupling capacitors (Black et al., 2004), patterning nanocrystal floating gates for FLASH devices (Guarini et al., 2003), and defining FET channel arrays (Black, 2005)
Subfields: Biomedical Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/21ec34d040c7e8707f709ddafa95292288ab83ba
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Citations in the corpus
- Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance (2015, methodology): “We note that the specifications discussed here are exclusive to BPM technology and come in addition to those previously suggested for BCP lithography in general [47].”
- Patterning surfaces with functional polymers. (2008, methodology): “The applications of polymer-patterned surfaces can be tentatively organized into several categories: (1) the fabrication of light-emitting displays (LEDs), semiconductor microelectronics and plastic electronics1–3; (2) bio-related and medicinal research including the study of cells and tissue engine”
- Block Copolymer Nanostructures for Technology (2010, background): “Transferring the self-assembled BCP pattern into the supporting substrate constitutes the most common example [4,5], while templating of magnetic materials [6], nanoparticles [7-11], and continuous thin metal films [12] have all been reported.”