Influence of high power densities on the composition of pulsed magnetron plasmas

By A. Ehiasarian, R. New, W. Münz, L. Hultman, Ulf Helmersson, V. Kouznetsov. 2002

295 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/5fbcbbc5879525a646ebb5fecea18ab9d85208da

How researchers see this paper

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In Electrical and Electronic Engineering

1. A. Anders

In Materials Chemistry

1. A. Anders

In Mechanics of Materials

1. A. Anders
2. J. Gudmundsson

Citations in the corpus

• A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (2014, background): “Often the power is simply normalized by the entire target area, which gives nominal values of up to 10(7) W/m(2) [154, 257, 268].”