Pushing the limits of lithography

By Takashi Ito, S. Okazaki. Nature, 2000

834 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/5b5193b8c869e07852abfb16b3ea89ec05556999

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Biomedical Engineering

1. Junhui He
2. Lin Yao
3. Jurriaan Huskens
4. C. Acikgoz
5. G. Vancso
6. M. Hempenius

In Electrical and Electronic Engineering

1. Lin Yao
2. Junhui He
3. Jurriaan Huskens
4. C. Acikgoz
5. G. Vancso
6. M. Hempenius

Citations in the corpus

• SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography (2007, neutral): “Pushed by the electronic industry, most developments in lithography have mainly been directed at shrinking the lateral dimensions of the imaged features [1] [2] [3] [4] [5] [6] [7] [8] [9] [10].”
• Polymers in conventional and alternative lithography for the fabrication of nanostructures (2011, methodology): “On the other hand, the main drawbacks of this technique are the limited resolution and the limited possibilities of working with pre-existing topography or curved substrates [1,2].”
• Recent progress in antireflection and self-cleaning technology – From surface engineering to functional surfaces (2014, methodology): “The previous fabrication strategy relied on costly e-beam lithography [158] and photolithography [159,160].”