Nanoimprint Lithography: Methods and Material Requirements
By L. J. Guo. 2007
1,799 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/55194b8b6dab643a6fc3ed11022d0d37b4a6afd5
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In Atomic and Molecular Physics, and Optics
- Boqin Zhao
- Zhuomin M. Zhang
- Saleem Khan
- Leandro Lorenzelli
- Ravinder S. Dahiya
- Yifu Ding
- Liang Wang
- Martin A. Green
In Biomedical Engineering
- Boqin Zhao
- Leandro Lorenzelli
- Ravinder S. Dahiya
- Jer‐Shing Huang
- Paolo Biagioni
- S. Pillai
- Martin A. Green
- Saleem Khan
In Electrical and Electronic Engineering
- Boqin Zhao
- S. Pillai
- Ravinder S. Dahiya
- Yifu Ding
- Liang Wang
- Martin A. Green
- Saleem Khan
- Jurriaan Huskens
Citations in the corpus
- Nanotopography-guided tissue engineering and regenerative medicine (2012, background): “Thermal energy can crosslink prepolymers filled into the cavities of molds (replica molding, RM) [61] or plastically deform thermoplastic polymers by applying heat and mechanical pressure together (nanoimprint lithography, NIL) [62,63].”
- Study of magnetic polaritons in deep gratings for thermal emission control (2014, background): “Since for the aforementioned deep gratings with the aspect ratio more than 20, even though the Bosch process [34] and nanoimprint lithography [35] could be used, the fabrication of the structure is still very challenging.”
- Technologies for Printing Sensors and Electronics Over Large Flexible Substrates: A Review (2015, background): “electron beam lithography (EBL) method [105], [152]–[154].”
- Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting. (2009, neutral): “P(t) ) 8F πa2L(( a 2) 2 (-a2 + V·t) 2)1/2 (4) ∴hf ) ( F μa(2)LV + 1 h02) -1/2 (5)”