International Electron Devices Meeting

By Технология. 2010

190 citations recorded by the source corpus.

View Paper: https://www.semanticscholar.org/paper/4ede69eca3dbc8b3b1ded3f4b48bc48bf203a4c0

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

1. Thomas Mikolajick
2. Manuel Bibes
3. M. Coll.
4. I. Fina
5. Vincent Garcia
6. Uwe Schroeder
7. J. Fontcuberta
8. Julie Grollier

Citations in the corpus

• Towards Oxide Electronics: a Roadmap (2019, background): “The discovery of ferroelectricity in HfO2 have also significantly changed the prospects of ferroelectric field effect transistors [365].”
• Atomic Layer Deposition for Semiconductors (2013, methodology): “Therefore, ALD appears to be a very timely and indispensable process for microelectronics, even though it was originally expected to achieve film deposition with uniform thickness (*lm) over a very large area for other applications [5].”