Characteristics and mechanism of conduction/set process in TiN∕ZnO∕Pt resistance switching random-access memories
By N. Xu, Lifeng Liu, X. Sun, Xiaohui Liu, Dedong Han, Yi Wang, R. Han, Jinfeng Kang, Bin Yu. 2008
365 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/4178f18d35a1b214a38f50dd753faa4d20c984f9
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In Electrical and Electronic Engineering
In Materials Chemistry
Citations in the corpus
- Voltage-Triggered Ultrafast Phase Transition in Vanadium Dioxide Switches (2013, background): “NiOx) serve as the conducting paths in a higher resistance matrix [9, 10].”
- Resistive Switching Characteristics of Sol–Gel Zinc Oxide Films for Flexible Memory Applications (2009, background): “It is known that the HRS current in ZnO oxide films can be explained by Poole–Frenkel emissions [2] or by hopping conduction [3].”
- A Physics-Based Compact Model of Metal-Oxide-Based RRAM DC and AC Operations (2013, background): “The resistive switching behavior is associated with the formation and rupture of conductivity filament (CF) [7]–[9].”
- A Phenomenological Model for the Reset Mechanism of Metal Oxide RRAM (2010, neutral): “With one of the electrodes replaced by oxidizable materials such as Ti, Al, TiN, or TaN, usually, bipolar mode is obtained, e.g., Ti/ZrO2/Pt [11], TiN/HfO2/Pt [14], TiN/ZnO/Pt [15], etc.”
- Unified Physical Model of Bipolar Oxide-Based Resistive Switching Memory (2009, methodology): “In our previous work [4], the set process was identified to”