Redox Reactions at Cu,Ag/Ta2O5 Interfaces and the Effects of Ta2O5 Film Density on the Forming Process in Atomic Switch Structures

By Tohru Tsuruoka, Ilia Valov, S. Tappertzhofen, J. van den Hurk, Tsuyoshi Hasegawa, Rainer Waser, Masakazu Aono. 2015

156 citations recorded by the source corpus.

Subfields: Cellular and Molecular Neuroscience, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/3d62600016ec5dfd462ce207a8443a93121a6cd1