Improving Analog Switching in HfOx-Based Resistive Memory With a Thermal Enhanced Layer
By Wei Wu, Huaqiang Wu, Bin Gao, Ning Deng, Shimeng Yu, He Qian. IEEE Electron Device Letters, 2017
187 citations recorded by the source corpus.
Subfields: Cellular and Molecular Neuroscience, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/33e5956d8804b7d5d63e0f8fe8e361ae9c39ff9e
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In Cellular and Molecular Neuroscience
In Electrical and Electronic Engineering
Citations in the corpus
- Neuro-Inspired Computing With Emerging Nonvolatile Memorys (2018, background): “To make the SET process gradual, one way is the oxide stack engineering (i.e. bilayer oxides) to make weak or multiple weak filaments as demonstrated in TaOx/HfO2 [73] and AlOx/HfO2 [74] devices.”