Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist
By M. Gnan, S. Thoms, D. Macintyre, R. Rue, M. Sorel. 2008
228 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/33c11e8aee512284ce4981f2cccb5212a2919bcc
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Atomic and Molecular Physics, and Optics
- Wim Bogaerts
- Shankar Kumar Selvaraja
- D. van Thourhout
- R. Baets
- Pieter Dumon
- J. Brouckaert
- K. Vos
- Liam O'Faolain
In Electrical and Electronic Engineering
- Wim Bogaerts
- Shankar Kumar Selvaraja
- D. van Thourhout
- R. Baets
- Pieter Dumon
- J. Brouckaert
- K. Vos
- Thomas F. Krauss
In Surfaces, Coatings and Films
- Wim Bogaerts
- Shankar Kumar Selvaraja
- D. van Thourhout
- Pieter Dumon
- R. Baets
- Thomas F. Krauss
- Po Dong
- C. Doerr
Citations in the corpus
- Silicon-on-Insulator Spectral Filters Fabricated With CMOS Technology (2010, background): “Somewhat lower propagation losses have been reported using e-beam lithography [32], [33],”
- Tunable Delay Lines in Silicon Photonics: Coupled Resonators and Photonic Crystals, a Comparison (2010, methodology): “The pattern was generated by e-beam lithography with proximity correction and stitching compensation to achieve low propagation losses, typically ranging from 1 to 3 dB/cm [ 6 ] and an accuracy better than 0.5 nm on the waveguide dimensions.”
- On-chip quantum interference between silicon photon-pair sources (2013, background): “1 dB/cm, though much lower loss is possible[34].”
- Slow Light Enhanced Nonlinear Optics in Silicon Photonic Crystal Waveguides (2010, background): “certainly compared with nanowires, which can exhibit effective lengths as long as 4 cm due to their lower loss [30], [31].”
- Fabrication of Photonic Wire and Crystal Circuits in Silicon-on-Insulator Using 193-nm Optical Lithography (2009, background): “Though low propagation loss photonic wires were reported using high resolution e-beam resist (HSQ) [1], a number of works have noted a degree of instability and irreproducibility issues in this material [8]–[10].”
- Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology (2010, background): “Recently tremendous progress has been made in reducing propagation loss and the loss of micro-bends [1], [2], [3].”
- Compact Single-Mode Silicon Hybrid Rib/Strip Waveguide With Adiabatic Bends (2011, background): “The best stepper-fabricated monocrystalline silicon wires demonstrated have losses larger than 2 dB/cm [2], [13], [14], and with e-beam fabrication, it is 1 dB/cm [ 15 ].”
- Non-Invasive On-Chip Light Observation by Contactless Waveguide Conductivity Monitoring (2014, unknown): “The waveguide pattern is written on a hydrogen silsesquioxane (HSQ) resist through electron-beam lithography and then transferred to the silicon core by an inductively coupled plasma etching process [17].”