Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

By K. Macak, V. Kouznetsov, J. Schneider, Ulf Helmersson, I. Petrov. 2000

272 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/32510b1cc9df083b21ca0113b9af126298d66e62

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. A. Anders

In Electronic, Optical and Magnetic Materials

1. A. Anders

In Mechanics of Materials

1. A. Anders
2. J. Gudmundsson

Citations in the corpus

• Deposition rates of high power impulse magnetron sputtering: Physics and economics (2010, background): “high power pulse magnetron sputtering (HPPMS), is an interesting addition to the family of sputtering technologies [1-5].”