Step and flash imprint lithography: Template surface treatment and defect analysis

By T. Bailey, B. Choi, Matthew E. Colburn, M. Meissl, S. Shaya, J. Ekerdt, S. Sreenivasan, C. Willson. 2000

331 citations recorded by the source corpus.

Subfields: Biomedical Engineering

View Paper: https://www.semanticscholar.org/paper/181226812aa0b5e0f2a96ab5581b00586824f72e

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In Biomedical Engineering

1. Stephen Y. Chou
2. G. Horowitz

Citations in the corpus

• 6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography (2005, background): “How much further the pitch can be reduced without replacing photolithography is a hot topic for debate.”
• Lithography and Other Patterning Techniques for Future Electronics (2008, unknown): “This process is repeated as the imprint mold is Bstepped[ from die to die across the wafer, repeating the resist drop and imprint cycle [ 45 ].”
• Directed self-assembly of block copolymers for use in bit patterned media fabrication (2013, background): “[35] and ultraviolet (UV) cure imprint lithography [36].”