Ionization of sputtered metals in high power pulsed magnetron sputtering

By J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian, Ulf Helmersson. 2005

247 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/135f55b9b1a0acd072ad88e08e5e4d4ea034407e

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. A. Anders

In Materials Chemistry

1. A. Anders

In Mechanics of Materials

1. A. Anders
2. J. Gudmundsson

Citations in the corpus

• A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (2014, background): “Many of early (2000s) papers on HiPIMS point focus on ionization of target atoms, which is often in the 30-70% range [271].”