BTI reliability of 45 nm high-K + metal-gate process technology

By S. Pae, M. Agostinelli, M. Brazier, R. Chau, G. Dewey, Tahir Ghani, M. Hattendorf, J. Hicks, J. Kavalieros, Kelin J. Kuhn and 12 more. IEEE International Reliability Physics Symposium, 2008

133 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/0827f766915c6badb00440dabc2d5c5a44dc977f