Low-Temperature Al2O3 Atomic Layer Deposition

By M. Groner, F. Fabreguette, Jeffrey W. Elam, S. George. 2004

1,315 citations recorded by the source corpus.

Subfields: Condensed Matter Physics, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/ff98aa1511cc48dc44e04062c7e87ea277fd258c

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In Materials Chemistry

1. J. Greer

Citations in the corpus

• Structural and XPS characterization of ALD Al2O3 coated porous silicon (2015, neutral): “Al2O3 ultra-thin films have been investigated for many applications like surface passivation [8,9], gas diffusion barrier [10], interfacial buffering for high-k dielectrics [11,12], and nanolaminates [13,14].”