High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

By S. Kim, Wan-Don Kim, Keum Do Kim, C. S. Hwang, Jaehack Jeong. 2004

322 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Renewable Energy, Sustainability and the Environment

View Paper: https://www.semanticscholar.org/paper/fb3e828f9f67125f8142aef009028fc76030e117