Graphene annealing: how clean can it be?

By Yung‐Chang Lin, Chun-Chieh Lu, C. Jin, K. Suenaga, P. Chiu. Nano letters (Print), 2012

941 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/3a9286907e9db75f76b4dbb6f14aaa1c6bc5b294

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Biomedical Engineering

1. Filippo Giubileo
2. A. Di Bartolomeo

In Electrical and Electronic Engineering

1. Filippo Giubileo
2. Kai Liu
3. Yinghui Sun
4. Xuewen Wang
5. A. Di Bartolomeo

In Materials Chemistry

1. Filippo Giubileo
2. Kai Liu
3. K. Kumar
4. Yinghui Sun
5. Xuewen Wang
6. Youn-Su Kim
7. A. Di Bartolomeo
8. Eui-Hyeok Yang

Citations in the corpus

• The role of contact resistance in graphene field-effect devices (2017, background): “Usual cleaning by acetone leaves some residues on graphene surface, mostly due to the van der Waals interactions as well as chemical bonds [152].”
• The influence of thermal annealing to remove polymeric residue on the electronic doping and morphological characteristics of graphene (2013, background): “Recent TEM studies [11] [21] have shown that alternate annealing under hydrogen and oxygen atmospheres removes a substantial majority of PMMA residue; however oxygen annealing introduces defects in the graphene lattice [21].”
• Chemical and structural stability of 2D layered materials (2019, background): “[144] Lin Y C, Lu C C, Yeh C H, Jin C H, Suenaga K and Chiu P W”