Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis

By Yu-Chih Tseng, Qing Peng, Leonidas E. Ocola, Jeffrey W. Elam, S. Darling. 2011

188 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/e81f380cc8b9d37ac7f35a79ebb6856448d9a87d

Citations in the corpus

• Sub-10 nm fabrication: methods and applications (2021, unknown): “Subsequential infiltration synthesis (SIS) effectively enhances the etch resistance by converting a specific block in a BCP to inorganic oxides using atom-layer deposition (ALD) [99, 100].”