Surface Recombination Measurements on III-V Candidate Materials for Nanostructure Light-Emitting Diodes
By M. Boroditsky, I. Gontijo, M. Jackson, R. Vrijen, Eli Yablonovitch, Thomas F. Krauss, Chuan-cheng Cheng, Axel Scherer, R. Bhat, M. Krames. 2000
164 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/dbe08d795c69694e8ee691e9b86241aa616ccaf3
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In Atomic and Molecular Physics, and Optics
- Michael R. Krames
- Toshihiko Baba
- M. Crawford
- S. Karpov
- Thomas F. Krauss
- A. I. Zhmakin
- Seyedali Mirjalili
- Andrew Lewis
In Electrical and Electronic Engineering
In Surfaces, Coatings and Films
Citations in the corpus
- III -nitride photonic-crystal light-emitting diodes with high extraction efficiency (2009, background): “Although surface recombination is low in iii -nitrides compared to other iii – v compound”
- Status and Future of High-Power Light-Emitting Diodes for Solid-State Lighting (2007, background): “thin active regions and the relatively low carrier surface recombination velocity of GaN [49].”
- Low-threshold lasing and Purcell effect in microdisk lasers at room temperature (2003, background): “Moreover, the GaInAsP compound materials allow a low-threshold lasing and the Purcell effect at room temperature, since the surface recombination velocity of GaInAsP is one to two orders of magnitude lower than that of GaAs [4], [11]–[13].”